Flat aperture rotary stage

HV, DUV / EUV, cleanroom ISO 5, n x 360°, rep 0.004°, speed 59°/s, Load 12 kg

Cleanroom-compatible, customizable

Thanks to the complete enclosure, the proven rotary stage series is characterized by low particle emission and is therefore ideal for use in cleanrooms (variants up to cleanroom class ISO 5, optionally up to class ISO 1 on request).

Chuck interfaces can be modified and adapted to application-specific requirements, for example by using a customer-specific hole pattern, contact surface with increased parallelism, integrated rotary feed-through or by using a quick-exchange interface.

With regard to surface finish and radiation resistance, there are also no restrictions. Whether anodized cleaned, aluminium cleaned bright, bilathal or nickel for optimum process suitability (e.g. particularly high degrees of cleanliness, resistance to cleaning with chemicals in the life science sector), even under beams such as UV, DUV or EUV (X-ray, gamma on request).

Fields of application

Wafer handling, inspection / microscopy e.g. AFM, electron microscope, ion microscope, scanning electron microscope, scanning tunneling microscope, transmitted light measurements in semiconductor technology, wafer inspection, laboratory microscopy, imaging systems, sample analysis, beamline instrumentation, synchrotron, materials research, materials analysis