This rather exotic UHV-assembly combines two coaxial rotational axes which can be moved axially during motion. Driven by Nanomotion motors.

The assembly has been designed and manufactured for use in electron beam lithography equipment. The assembly is designed for an environment of 10^-7 Torr (approx. 10^{-5 Pa}). Suitable magnet-free materials were used to minimize permanent and electromagnetic influences on the ion beam.