2X-Y-Ys (XYZ) positioning system for wafer inspection / Raman spectroscopy up to 12"/ panel (cleanroom ISO 4) | travel 400 x 400 mm
Inspection and Mikroscopy

AB.Raman.V3

 

The 2X-Y-Ys(Z) positioning system provides high-resolution motions in XYZ for samples up to 400 x 400 mm with additional feeding range and loads up to 40 kg. The gantry structure handles the XY motion. With a double-length travel in the upper axis, a feeding range of further 400 mm is realized in addition to the 400 mm operating travel in XY. Vertical motions and the focus are realized by an inclined stage with simultaneous motion of the Y-axis. The inclined travel is part of the feeding range. The vertical motion in Z is performed by simultaneous control of the Y and Ys axes.

  • Various scanning areas up to 400 x 400 mm for wafer up to 12 inch / panel up to 400 mm (larger on request)
  • Set-up for stationary optics - only the chuck is being moved
  • Combined motion of wedge and traverse for height adjustment (additional feeding range of 400 mm).
  • Gantry combination for maximum rigidity and high loads up to 50 kg

Options:

  • Linear scale for 0.5 µm repeatability
  • Scanning stages with high-precision ball screw, lead screw or linear motor for high throughput
  • Tilt stages for aligning the chuck
  • High-resolution rotary stage for measuring round samples
  • Adaptation to the process: Aperture, sample holder, extension of additional (motorized) stages
  • Safety concept and technology (emergency stop, door switch, light grid, laser scanner, STO, SLS)
  • Individual setup with rack, enclosure or integration into the fab
  • Customized development with 3D design, prototypes, series production

Fields of application

Analysis of organic compounds on high-purity surfaces up to cleanroom ISO 4 or higher (sample size up to 12 inch / 400 x 400 mm), wafer inspection, Semiconductor production and development, chucks, wafers, chips, inspection of functional surfaces in semiconductor production to rule out contamination: Lithopraphy equipment, wafer steppers, dicing, display manufacturing, physical surface analysis, drug development, Assey development, screening, drug optimization, material testing

 

AB.Raman.V3 2X Y Z (Ys)
Standard System PLT165-SM-L PLT240-SM-L PLT165-SM-L
Travel [mm] 400 900 40
Repeatability unidirectional   [µm] ± 0.3 ± 0.3 ± 0.3
Repeatability bidirectional   [µm] ± 0.5 ± 0.5 ± 0.5
Positioning speed [mm/s] 40 40 10
Max. speed [mm/s] 80 80 20
Max. load [N] 0 0 400
Max. sample dimension   Ø 400 mm / 12" (higher on request)  
Length x width x height [mm] 1500 x 1100 x 1000
Drive   Ball Screw, optional Lead Screw or Linear Motor
Spindle type   1412.570/5.16.539.644 P5P / 222138
Spindle lead   5 5 5
Guide   Profile Rail Profile Rail Profile Rail
Motor   Stepper Motor Stepper Motor Stepper Motor
Feedback   Linear Scale (optional Open Loop)
Optional features Design with linear motors for dynamic applications, Linear scale for 0.5 µm repeatability, tilting stages for alignment of the chuck, rotary stage, brake, sample holder, housing, safety concept and installation (emergency stop, door switch, safety light curtains, laser scanner, STO, SLS)
Clean room variants up to clean room class ISO 4 (higher on request)
Beam variants UV, DUV (EUV, X-ray, gamma on request)
Variants magnetism magnetic (low magnetic on request)

 


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