Yield maximization in the smallest possible construction space

This high-precision positioning system has been specifically designed as a complementary polarization filter for miniaturization and automation in DUV lithography. It maximizes the exposure quality as well as the yield of an existing wafer stepper in a very limited space of about 120 x 180 x 31 mm. For this purpose, three independently positionable filters are shifted in the optical system's beam path.It can be used for high-resolution processes under extreme environmental conditions, such as DUV and a dry as well as oxygen-free pure nitrogen atmosphere.

Optimizing accuracy in extreme environments

Individual extensions and customizations

Engineering services include the fitting of the systems to your structure and the desired controlls. Furthermore, we develop prototypes and like to adapt the systems to the environmental requirements of your application particle emission, radiation, temperature, precision special parts manufacturing, working height, collision protection, safety concept, compensation factor and filter, sensor mounting, brake, decoupling, special lubrication, special colors, holders, adapters, special motors with pharmaceutical approval, comprehensive documentation, test protocoll, llife cycle tests

Fields of application

Miniaturization and automation in standard, electron beam and DUV lithography e.g. wafers, chips, die, pins, bonding, printed circuit boards, solar cells, solar panels, polarization sensitive photosensors as well as microstructuring, filter adjustment, measurement of polarization of incident light